P30 plasma cleaning etching machine

The plasma etching and cleaning machine consists of a vacuum chamber, plasma power supply, vacuum extraction system, gas filling system, control system, and other components. The basic working principle is that under vacuum conditions, plasma can ionize gas under controlled and qualitative methods. A vacuum pump evacuates the chamber to a vacuum degree of 0.02-0.03 mbar, and then, under the action of a plasma power source, the gas is ionized to form plasma (the fourth state of matter). Plasma power supplies energy to ionize the gas into a plasma state. A notable feature of the plasma state is its highly uniform glow discharge, emitting visible light ranging from blue to deep purple depending on the gas, with material processing temperatures close to room temperature. These highly active microparticles interact with the treated surface, resulting in various surface modifications such as hydrophilicity, water repellency, low friction, high cleanliness, activation, and etching.