The desktop sputtering coating system adopts a circular vacuum chamber structure, with side suction and front-opening door design, made of high-quality austenitic stainless steel. One (or two) 2-inch (or 3-inch) magnetron sputtering targets are installed on the top plate of the sputtering deposition chamber, with the outgoing beam directed toward the substrate holder to obtain a thin film on the substrate. This equipment has a simple structure and can be used for the research and development of nanoscale single-layer and multilayer functional films, such as rigid films, metal films, semiconductor films, dielectric films, composite films, ferromagnetic films, and magnetic thin films.
